The Screening Fab of the Fraunhofer Institute for Photonic Microsystems (IPMS) successfully finished a one year collaborative relationship with South Korean semiconductor equipment manufacturer NextIn.
As part a cooperation from 2015-2016, a new defect inspection system has been evaluated in the clean room of Center Nanoelectronic Technologies (IPMS-CNT). The tool allows the visual detection, automatic classification and characterization of different defect types on structured wafers (200 mm and 300 mm).
The NextIn Aegis I Wafer Inspection System makes it possible to combine bright field and dark field imaging in one tool, which significantly increases the number of different applications in semiconductor research and development.The Fraunhofer IPMS-CNT has evaluated the Aegis I in its research facility in various customer projects and achieved excellent and competitive test results in the sub 100 nm area.
After this evaluation NextIn is now able to offer a flexible metrology tool for the 2x nm technology node in FEoL, MoL and BEoL processes.
The Fraunhofer IPMS - Center Nanoelectronic Technologies serves as a link between the semiconductor industry and applied science in the segment of 300 mm wafer technology. Manufacturers and suppliers are able to test, optimize and implement new developments on an industrial level for a risk-free integration in mass production.